2018
Part 2 of a 5 part series on cleaning & chemical sensitivity – Source Removal
By Michael Pinto, CSP, SMS, CMP, CFO
(Originally published in R&R Magazine – February 2018)
Source Removal
In the first part of this series, a number of core concepts were introduced including the:
Now it is time to start discussing some specifics. As we begin, it is important to remember that cleaning structures for chemically sensitized individuals involves the removal or control of chemical source material as well as the removal of chemical residues, including residue that has adhered to dust. Parts 3, 4, and 5 of this series will focus on removal or control of chemical sources through neutralization, off-gassing, and oxidation. In this segment we will focus on physical removal of the offending materials and cleaning techniques for the microscopic particles that also contribute to the problem.
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